【工作笔记】给状元的样品加工

This is the sample log

• test: NV are on the depth of about 20um, no shallow NV
• ICP long time (recipe: Ar/Cl2 160W 200W 30min * 12times real depth = 10.11um) follows piranha clean
• test: surface is a slope - unable to determine surface position; surface is dirty
• ICP (recipe: O2-7/Ar-8 normal) follows piranha clean
• test: surface is still bad (slope even broader), no NV in proper depth
• ICP (recipe: O2-7/Ar-8 normal) follows piranha clean
• test: the same as ICP before
• ICP (recipe: Ar/Cl2 200W 320W 1. 1h real_depth=2.5um 2. 2h real_depth=5.65um total_depth=8.58um) follows piranha clean
• Piranha, Evaporate Al 20nm
• adhere sample to stage by colloidal silver and bake 30min at 110°C
• FIB chipname and markers (700um*700um)
• remove Al and colloidal silver
• NV location (found 10)
• NV spectrum testing (Chang Xiuying)